Method for predicting at least one illumination parameter for evaluating an illumination setting

ABSTRACT

In a method for predicting at least one illumination parameter for evaluating an illumination setting for illuminating an object field of a projection exposure apparatus, illumination parameters are measured at a number of calibration settings, correction terms for prediction values of the illumination parameters are determined from the measured values, and then at least one illumination parameter of at least one illumination setting, which is not contained in the set of n calibration settings, is predicted.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a continuation of, and claims benefit under35 USC 120 to, U.S. application Ser. No. 15/481,607, filed Apr. 7, 2017,now U.S. Pat. No. 10,078,267, which is a continuation of, and claimsbenefit under 35 USC 120 to, international applicationPCT/EP2015/075011, filed Oct. 28, 2015, which claims benefit under 35USC 119 of German Application No. DE 10 2014 223 326.7, filed Nov. 14,2014. The entire disclosures of U.S. application Ser. No. 15/481,607,international application PCT/EP2012/054664 and German Application No.DE 10 2014 223 326.7 are incorporated by reference herein.

FIELD

The disclosure relates to a method for predicting at least oneillumination parameter for evaluating an illumination setting forilluminating an object field of a projection exposure apparatus. Thedisclosure furthermore relates to a method for optimizing anillumination setting for illuminating an object field of a projectionexposure apparatus.

BACKGROUND

A projection exposure apparatus which enables the illumination of anobject field with a multiplicity of different illumination settings isknown from e.g. DE 10 2012 220 596 A1.

SUMMARY

The present disclosure seeks to improve a method for predicting at leastone illumination parameter for evaluating an object field.

In one aspect, the disclosure provides a method for predicting at leastone illumination parameter for evaluating an illumination setting forilluminating an object field of a projection exposure apparatus. Themethod includes providing an illumination optical unit including atleast one facet element for generating a plurality of illuminationsettings with a plurality of illumination channels. The method alsoincludes providing a model for predicting a plurality of illuminationparameters depending on the illumination setting. The method furtherincludes calibrating the model by: providing correction terms forprediction values of a first subset of the illumination parameters;measuring actual values of the illumination parameters in the case of anumber of calibration settings; determining correction terms forprediction values of a second subset of the illumination parameterstaking into account the measured values; and updating the model takinginto account the correction terms. In addition, the method includespredicting at least one illumination parameter of at least oneillumination setting, which is not contained in the set of calibrationsettings, via the updated model.

A feature of the disclosure involves calibrating a model for predictinga plurality of illumination parameters, depending on the illuminationsettings generable by an illumination system, by providing and/ordetermining correction terms, wherein one subset of the correction termsis substantially constant in time and a subset of correction terms,deviating therefrom, reflects dynamic variations and is determined withthe aid of a measurement on the basis of at least one calibrationsetting.

What was discovered according to the disclosure is that it is desirableto calibrate the model for predicting the illumination parameters. Whatwas furthermore discovered according to the disclosure is that there arecorrection terms which are constant or at least substantially constant,at least for a specific period of time of up to a few days, inparticular a few weeks, in particular a few months, in particular untilone or more components of the illumination system are replaced. Here,these can be, in particular, correction terms for correcting geometricdeviations of the illumination optical unit. In particular, thecorresponding correction terms need only be determined once, inparticular when putting the illumination optical unit into operation. Inaccordance with one aspect of the disclosure, the correspondingcorrection terms are established on the basis of system data of theillumination optical unit.

What was furthermore discovered according to the disclosure is thatthere are other correction terms which need to be re-determinedregularly, in particular on a timescale of a few hours, in particular afew days. In particular, these are correction terms for correctingdynamic variations, e.g. variations in the radiation source. In thisrespect, what was identified is that it may be sufficient to measure anumber n of calibration settings for determining these correction terms,which number, in particular, is less than the overall number ofillumination settings generable by the illumination optical unit. Inparticular, it may be sufficient to measure merely at most 50, merely atmost 10, in particular at most 5, in particular at most 3, in particularat most 2, in particular merely 1 calibration setting. The correspondingcorrection terms can be adopted for the remaining settings. Inaccordance with one aspect of the disclosure, the correspondingcorrection terms are established on the basis of measurements. Inparticular, they are established on the basis of measurements of atleast one illumination pupil. In particular, intensity variations emergefrom these measurements.

Therefore, the measurement time for calibrating the model can besignificantly shortened by the method according to the disclosure. As aresult of this, overall, the throughput of the projection exposureapparatus is increased.

In accordance with one aspect of the disclosure, the illuminationparameters which are predictable by the model include intensitycentroids and/or integral intensities of each pupil spot of anillumination setting. The deviations of the intensity centroids resultprimarily from geometric deviations of the elements of the illuminationoptical unit from an ideal state. These deviations are substantiallyconstant in time.

The deviations of the integral intensities can be traced back to e.g.dynamic variations of the radiation source, in particular of theillumination radiation emitted by the radiation source, in particular inview of the intensity thereof and/or geometric variations of the same,in particular radiation direction and/or beam divergence. What wasidentified according to the disclosure is that intensity deviationswhich are dominated by the radiation source are substantially the samefor different illumination settings. It is therefore sufficient tomeasure the corresponding correction terms on the basis of a fewillumination settings, in particular on the basis of a singleillumination setting. They can be assigned to other illuminationsettings.

In particular, the illumination parameters predictable by the model canbe predicted in a manner resolved according to illumination channels, inparticular according to pupil spots. Pupil spots and illuminationchannels are directly related to one another. The optical path from theintermediate focus via a field facet via a pupil facet to the reticle isreferred to as illumination channel. The pupil spot denotes theillumination in the pupil resulting from a specific illumination channelwhen the illumination channel is used in a setting. In particular, thesecan be predicted resolved according to field points.

In accordance with a further aspect of the disclosure, a number m ofcalibration measurements are carried out for providing the correctionterms for the first subset of illumination parameters. In particular,these calibration measurements are carried out once when theillumination optical unit is put into operation. Here, in particular,correction terms for the intensity centroids of the illumination pupil,in particular of all individual illumination channels, are determined.The corresponding correction terms can be stored in a memory of theillumination optical unit. In particular, they can be determined whenputting the illumination optical unit into operation and/or whenservicing the latter and are subsequently retrievable during operationof the projection exposure apparatus.

In particular, all illumination channels are taken into account whendetermining these correction terms; in particular, the relevantillumination settings covering all illumination channels are measured.

In accordance with a further aspect of the disclosure, the set ofcorrection terms for the prediction values of the first subset of theillumination parameters includes correction terms for predictingintensity centroids of illumination settings. In particular, it onlyincludes such correction terms. In particular, it does not include anycorrection terms for predicting intensities.

In accordance with a further aspect of the disclosure, the set ofcorrection terms for the prediction values of the second subset of theillumination parameters includes correction terms for predictingintensities. In particular, it only includes such correction terms. Inparticular, it does not include any correction terms for predictingintensity centroids.

In particular, the sets of the correction terms for the predictionvalues of the different subsets of the illumination parameters can bewithout an intersection, i.e. disjoint.

In accordance with a further aspect of the disclosure, the number n ofcalibration settings for determining the correction terms for theprediction values of the second subset of the illumination parameters isat most equal to a number m of calibration measurements, which areperformed for providing the correction terms for the prediction valuesof the first subset of the illumination parameters. In particular, thefollowing applies: n≤m, in particular n/m≤0.7, in particular n/m≤0.5.

In accordance with a further aspect of the disclosure, the correctionterms, in particular the correction terms for the prediction values ofthe first subset of the illumination parameters and/or the correctionterms for the prediction values of the second subset of illuminationparameters, are re-determined where desired. The re-determinedcorrection terms, i.e. the updated correction terms, can be stored, inparticular in the case of correction terms for the first subset ofillumination parameters. In particular, it is possible to update thememory with the correction terms. Updating the memory can be provided atpredetermined times or when a predetermined update condition occurs.

In accordance with one aspect of the disclosure, the correction termsfor the prediction values of the second subset of the illuminationparameters are updated more frequently than the correction terms for theprediction values of the first subset of the illumination parameters.

A further object of the disclosure consists of improving a method foroptimizing an illumination setting.

This object is achieved by a method in which a model for predictingillumination parameters depending on an illumination setting is providedand calibrated in accordance with the description above and then used topredict illumination parameters which are included in a suitableevaluation function for evaluating an illumination setting. According tothe disclosure, provision is made for varying illumination settingsevaluated thus iteratively until a predetermined termination criterionis achieved.

Since the illumination parameters can be predicted in a substantiallybetter and/or more reliable manner using the model calibrated accordingto the disclosure, this also applies to the value of the evaluationfunction. Consequently, the method according to the disclosure enables amore reliable optimization of an illumination setting.

BRIEF DESCRIPTION OF THE DRAWINGS

Further details and specifics of the disclosure emerge from thedescription of exemplary embodiments on the basis of the drawings. Indetail:

FIG. 1 shows a schematic illustration of the components of amicrolithographic projection exposure apparatus,

FIG. 2 schematically shows a flowchart of a method for predicting anillumination parameter for evaluating an illumination setting,

FIGS. 3A to 3G show exemplary diagrams for elucidating the correlationsbetween measurements and radiation intensities, predicted via the model,of individual illumination channels for different illumination settings,wherein, for elucidation purposes, correlations of the non-calibratedmodel (open circles) and correlations of the model calibrated accordingto the disclosure (crosses) are depicted in each case, and

FIG. 4 schematically shows a flowchart of a method for optimizing anillumination setting.

DETAILED DESCRIPTION

Below, the basic design of a microlithographic projection exposureapparatus 1 is first of all described in an exemplary manner. Thedisclosure is not restricted to the specific details of this embodiment.In particular, it can also be applied in the case of alternativeembodiments of projection exposure apparatuses 1, in particularillumination optical units. The projection exposure apparatus 1substantially corresponds to the one known from DE 10 2012 220 596 A1,which is referred to herewith. In particular, DE 10 2012 220 596 A1 isherewith integrated in its entirety into the present application as acomponent thereof.

A microlithographic projection exposure apparatus 1 serves to produce amicrostructured or nanostructured electronic semiconductor component. Aradiation source 2 emits used EUV radiation in the wavelength range ofe.g. between 5 nm and 30 nm for illumination purposes. The radiationsource 2 can be a GDPP (gas discharge produced plasma) source or an LPP(laser produced plasma) source. A radiation source based on asynchrotron can also be used for the radiation source 2. A personskilled in the art finds information about such a radiation source ine.g. U.S. Pat. No. 6,859,515 B2. EUV illumination light or illuminationradiation 3 is used for illumination and imaging within the projectionexposure apparatus 1. After the radiation source 2, the EUV illuminationlight 3 initially passes through a collector 4, which may be e.g. anested collector with a multi-shell design known from the prior art or,alternatively, an ellipsoidally formed collector. A correspondingcollector is known from EP 1 225 481 A2. After the collector 4, the EUVillumination light 3 initially passes through an intermediate focalplane 5, which can be used to separate unwanted radiation or particlecomponents from the EUV illumination light 3. After passing through theintermediate focal plane 5, the EUV illumination light 3 initiallyimpinges on a field facet mirror 6 with a multiplicity of field facets7.

In order to simplify the description of positional relationships, aglobal Cartesian xyz coordinate system is respectively plotted in thedrawing. In FIG. 1, the x-axis extends perpendicular to the plane of thedrawing and out of the latter. In FIG. 1, the y-axis extends to theright. In FIG. 1, the z-axis extends upward.

In the region of the object plane and the image plane, the y-directioncorresponds to the scanning direction of the reticle and of the wafer.

After reflection at the field facet mirror 6, the EUV illumination light3 split into bundles of rays or partial beams which are assigned to theindividual field facets 7 impinges on a pupil facet mirror 10 with amultiplicity of pupil facets 11.

The field facets 7 of the field facet mirror 6 are tiltable between aplurality of illumination tilting positions, such that a beam path ofthe illumination light 3 reflected by the respective field facet 7 canthereby be altered in terms of its direction and the impingement pointof the reflected illumination light 3 on the pupil facet mirror 10 canthus be altered. Corresponding field facets that can be displacedbetween different illumination tilting positions are known from U.S.Pat. No. 6,658,084 B2 and U.S. Pat. No. 7,196,841 B2.

Each partial beam of the EUV illumination light 3 which is reflected byone of the field facets 7 is assigned at least one pupil facet 11 insuch a way that a respective impinged-upon facet pair including one ofthe field facets 7 and one of the pupil facets 11 predefines an objectfield illumination channel for the associated partial beam of the EUVillumination light 3. The object field illumination channel is alsodenoted as illumination channel below. The channel-wise assignment ofthe pupil facets 11 to the field facets 7 is effected in a mannerdependent on a desired illumination by the projection exposure apparatus1. The totality of the correspondingly selected illumination channels isalso referred to as illumination setting.

By way of the respective illumination tilting positions of therespective field facet 7, the disjoint set of pupil facets 11 of thepupil facet mirror 10 is assigned to this field facet 7. Each one of thepupil facets 11 from one of these sets is impinged upon by illuminationlight 3 by way of exactly one of the various tilting positions of theassociated field facets 7 such that, depending on the tilting positionof the field facet 7, a specific illumination channel is formed betweenthe field facet 7 and one of the pupil facets 11 of the pupil facet set.The illumination channels which can be used depending on the tiltingposition of exactly one of the field facets 7, that is to say by way ofwhich the pupil facets 11 of the disjoint set of pupil facets 11assigned to this field facet 7 can be impinged upon with theillumination light partial beam, form an illumination channel group. Afield facet 7 can have more tilting positions which can be set via anactuator connected therewith than tilting positions which lead to theformation of an illumination channel. Only a tilting position whichleads to the formation of an illumination channel is intended to bereferred to as tilting position below.

The field facet mirror 6 has several hundred field facets 7, for example300 field facets 7. The pupil facet mirror 10 has a number of pupilfacets 11 which is at least as large as the sum of the tilting positionsof all field facets 7 of the field facet mirror 6. In this case, some ofthe pupil facets are not used for the employed assignment of pupilfacets to field facets. In particular, it is advantageous if the sum ofthe tilting positions of all field facets 7 of the field facet mirror 6is equal to the number of pupil facets 11. In a variant not depictedhere, the pupil facet mirror 10 is constructed as MEMS mirror array witha multiplicity of tiltable individual mirrors, wherein each one of thepupil facets 11 is formed by a plurality of such individual mirrors.Such a design of the pupil facet mirror 10 is known from US 2011/0001947A1.

The field facets 7 are imaged in an object plane 16 of the projectionexposure apparatus 1 by way of the pupil facet mirror 10 (cf. FIG. 1)and a subsequent transmission optical unit 15 consisting of three EUVmirrors 12, 13, 14. The EUV mirror 14 is configured as a mirror forgrazing incidence (grazing incidence mirror). Arranged in the objectplane 16 is an object in the form of reticle 17, of which anillumination region in the form of an illumination field is illuminatedusing the EUV illumination light 3, which illumination region coincideswith an object field 18 of a projection optical unit 19 of theprojection exposure apparatus 1 disposed downstream thereof. The objectfield illumination channels are superposed in the object field 18. TheEUV illumination light 3 is reflected by the reticle 17.

The projection optical unit 19 images the object field 18 in the objectplane 16 into an image field 20 in an image plane 21. Arranged in thisimage plane 21 is a wafer 22, which carries a light-sensitive layerwhich is exposed during the projection exposure using the projectionexposure apparatus 1. During the projection exposure, both the reticle17 and the wafer 22 are scanned in the y-direction in a synchronizedmanner. The projection exposure apparatus 1 is configured as a scanner.The scanning direction y is also referred to as object displacementdirection below.

The field facet mirror 6, the pupil facet mirror 10 and the mirrors 12to 14 of the transmission optical unit 15 are components of anillumination optical unit 23 of the projection exposure apparatus 1. Inone variant of the illumination optical unit 23, which is not depictedin FIG. 1, it is also possible to partly or completely dispense with thetransmission optical unit 15 such that no further EUV mirror, exactlyone further EUV mirror or else exactly two further EUV mirrors may bearranged between the pupil facet mirror 10 and the object field 18. Thepupil facet mirror 10 can be arranged in an entry pupil plane of theprojection optical unit 19.

Together with the projection optical unit 19, the illumination opticalunit 23 forms an optical system of the projection exposure apparatus 1.

The illumination optical unit 23 is a component of an illuminationsystem 24, which moreover includes the radiation source 2.

The field facet mirror 6 constitutes a first facet mirror of theillumination optical unit 23. The field facets 7 constitute first facetsof the illumination optical unit 23.

The pupil facet mirror 10 constitutes a second facet mirror of theillumination optical unit 23. The pupil facets 11 constitute secondfacets of the illumination optical unit 23.

A method for predicting at least one illumination parameter forevaluating an illumination setting for illuminating the object field 18,in particular the reticle 17 arranged in the object field 18, during theoperation of the projection exposure apparatus 1 is described below. Amodel, in particular a simulation model, serves to predict theillumination parameters. The model includes design data of theprojection exposure apparatus 1, in particular of the illuminationoptical unit 23. The model can also include further design data, inparticular of the radiation source 2 and/or of the collector 4. Acorresponding model is known e.g. from DE102012220596A1, to whichreference is hereby made.

In particular, the model renders possible the prediction of intensitycentroids rhx^(PP), rhy^(PP) and integral intensities I^(PP) of theillumination spots in an illumination pupil. This should be understoodto mean, in particular, the field point-resolved angle distribution ofthe illumination radiation on the reticle.

What was identified is that there may be errors in the prediction of theillumination quality (imaging performance) of the different illuminationsettings due to deviations of the real system from the design, i.e. fromthe setpoint state thereof. In particular, the illumination quality canbe characterized by parameters such as uniformity, telecentricity orellipticity of the illumination. Alternatively, it is possible to use astructure resolution achievable by the illumination when imaging theilluminated object field 18 into the image field 20 as an illuminationparameter. It is also possible to use a variation of a line width of animaged structure over the image field 20 as a parameter for evaluatingan illumination setting. In respect of further details, reference ismade to DE 10 2012 220 596 A1 and the prior art cited therein.

According to the disclosure, a real illumination pupil is measured. Itis chopped into individual illumination spots. The energetic centroidrhx^(MESS), rhy^(MESS) and the total intensity I^(Mes) contained thereinis determined for each spot. The illumination parameters which reflectthe imaging performance, such as e.g. uniformity, telecentricity orellipticity, can be determined from these measurement data. Accordingly,the model serves to predict the illumination parameters, in particularto predict the illumination centroids of the pupil spots and theintensity contained therein, i.e. the prediction of the illuminationpupil. This information serves as input of the further models, by whichthe imaging performance can be determined and/or predicted.

What was identified according to the disclosure is that the measuredillumination pupils can be used to improve the prediction for furtherillumination settings. In particular, it is possible to measure arelatively small number of illumination settings, for example at most10, in particular at most 5, in particular at most 3, in particular atmost 2, in particular merely 1 illumination setting, in order thereby toimprove the prediction accuracy of the model for a multiplicity of otherillumination settings, in particular for all illumination settingsgenerable by the illumination optical unit.

The model for predicting the illumination parameters serves inparticular to predict the intensity centroids rhx^(PP) _(ijk), rhy^(PP)_(ijk) and the intensities I^(PP) _(ijk), where i denotes the index ofthe illumination spot, in particular of the illumination spot in aspecific illumination setting, in the pupil, j indexes the illuminationsetting and k characterizes the field point. In particular, the index iof the illumination channel runs from 1 to the number of spots in apupil, i.e. up to 100, in particular up to 300, up to 500, up to 1000 ormore; the index k of the field point runs e.g. from 1 to the number ofmeasured field points, i.e. up to 3, in particular to 5, in particularup to 10, up to 20 or more. Other values are likewise possible.

The actual values of these parameters emerging from measurements aredenoted by rhx^(mess) _(ijk), rhy^(mess) _(ijk) and I^(Mess) _(ijk).

For the purposes of comparability of different field points andillumination settings, the overall intensities of a pupil, i.e. theoverall intensities of an illumination setting, can be normalized to 1:

${\sum\limits_{i}I_{ijk}^{PP}} = 1$${\sum\limits_{i}I_{ijk}^{Mess}} = 1$

Using this normalization, the following correction terms emerge for theintensities I_(ijk) and centroids rhx_(ijk), rhy_(ijk), taking intoconsideration the overall intensities I_(tot):

$v_{ijk} = \frac{I_{ijk}^{Mess} \cdot I_{{tot},{jk}}^{Mess}}{I_{ijk}^{PP} \cdot I_{{tot},{jk}}^{PP}}$Δ rhx_(ijk) = rhx_(ijk)^(Mess) − rhx_(ijk)^(PP)Δ rhy_(ijk) = rhy_(ijk)^(Mess) − rhy_(ijk)^(PP)

Here, I^(mess) _(tot,jk) and I^(PP) _(tot,jk) denote the overallintensities of the respective pupils prior to the normalization underthe assumption that the radiation source maintains its emissioncharacteristic during the measurements and the measurement time of eachmeasurement is constant. In this manner, two pupils with differentsettings and field points become comparable to one another. If this werenot the case, it would be unclear for a specific factor in the case ofan intensity difference between two spots as to whether this actually isa property of the illuminator or whether the exposure times of themeasurements differed by this factor.

What was identified according to the disclosure is that the number ofillumination settings for establishing correction terms for eachillumination channel is generally less than the overall number of allpossible illumination settings. FIGS. 3A to 3G depict, in an exemplarymanner, the effect of taking into account the above-described correctionterms on the prediction of the intensities of individual illuminationchannels. In each case, the prediction value (y-axis) is plotted againstthe actual measured value (x-axis).

The prediction values without taking into account the correction termsare denoted by circular symbols. The prediction values taking intoaccount the aforementioned correction terms are characterized by +symbols.

Seven different illumination settings are depicted in an exemplarymanner, wherein the illumination settings depicted in FIGS. 3A and 3Bwere used for establishing the correction terms. The prediction of theintensities of the illumination settings depicted in FIGS. 3C to 3G wascarried out taking into account the correction values established on thebasis of the illumination settings underlying FIGS. 3A and 3B. As canclearly be identified qualitatively, only taking into account thecorrection terms leads to a clear correlation between the predictionvalues and the measured values.

What has emerged furthermore is that taking into account the correctionterms also has a significant influence on predicting the conventionalpupil parameters such as e.g. telecentricity and ellipticity.

By way of example, it was possible to improve the prediction error forthe telecentricity by a factor of more than 2. In some illuminationsettings, the prediction error for telecentricity could also be improvedby a factor of more than 3, in particular of more than 5, in particularof up to 10.

What was identified according to the disclosure is that significantmeasurement time can be saved when determining the correction terms. Inparticular, this can be traced back to the fact that a subset of thecorrection terms, which are denoted by s_(i) below, is substantiallyconstant in time. By way of example, these include the correction termsΔrhx_(ijk) and Δrhy_(ijk). This results primarily from geometricdeviations of the illumination optical unit. It is sufficient todetermine these correction terms only once, in particular when puttingthe illumination optical unit 23 into operation. Then, they can bestored in a memory of the illumination system. They can be updated wheredesired.

In particular, the correction terms s_(i) can be established on thebasis of system data of the illumination optical unit 23. In particular,they can be established on the basis of a selection of the individualpart acceptance data, overall system acceptance data and calibrationdata described in DE 10 2012 220 596 A1.

Another subset of the correction terms, which is denoted by f_(i) below,is traced back to dynamic variations. By way of example, these includethe corrections v_(ijk).

The intensity deviations v_(ijk) are dominated by variations in theradiation source. What was identified is that it is therefore sufficientto establish the corresponding correction terms for a small number ofillumination settings, in particular at most 10, in particular at most5, in particular at most 3, in particular at most 2, in particularexactly 1 illumination setting. The corresponding correction termsv_(ijk) can then be adopted for the remaining illumination settings. Asignificant amount of measurement time can be saved thereby.

In particular, the correction terms f_(i) can be established on thebasis of a selection of the online measurement data described in DE 102012 220 596 A1.

The concept according to the disclosure is advantageous, in particular,for illumination optical units 23 with a large number of differentswitching positions.

Below, the method for predicting at least one illumination parameter p*for evaluating an illumination setting is described once again in otherwords, with reference being made to FIG. 2.

Initially, m calibration settings j_(Kal) generated by the illuminationsystem 24 are measured in a first measurement step 31.

In a first determination step 32, the correction terms s_(i) for theprediction values of the first subset p₁ of the illumination parametersp are determined. In particular, the correction terms s_(i) aredetermined on the basis of the measured values from the firstmeasurement step 31.

Then, a check is carried out in a first query 33 as to whether thecorrection terms f_(i) are already determined.

If this is not the case, n≤m calibration settings j_(Kal) generated bythe illumination system are measured in a second measurement step 34.

The correction terms f_(i) are determined in a second determination step35 on the basis of the measured values from this second measurement step34.

Once both the correction terms s_(i) and the correction terms f_(i) aredetermined, it is possible to wait until a prediction of an illuminationparameter becomes desirable. This is depicted in FIG. 2 as calibratedbasic state 36. To the extent that what emerges in the first query 33 isthat the correction terms f_(i) are already determined, it is possibleto transition immediately to the basic state 36. Initially, it is notnecessary to once again carry out the second measurement step 34 and thesecond determination step 35.

Together, the steps 31 to 35 form a calibration part 37 for calibratingthe model for predicting the illumination parameters. Advantageously, asfew calibration settings j_(Kal) as possible are measured in thecalibration part 37. The number of calibration settings is less than 50,in particular less than 10, in particular less than 5, in particularless than 3, in particular less than 2. In particular, it is merely 1.

After calibrating the model in the calibration part 37, an illuminationparameter of an illumination setting j* can be predicted in a predictionpart 38. To this end, a check is initially carried out in a second query39 as to whether the correction terms s_(i) are still current. To theextent that this is not the case, there is a return to the firstmeasurement step 31. To the extent that the correction terms s_(i) arestill current, a check is carried out in a third query 40 as to whetherthe correction terms f_(i) are still current. To the extent that this isnot the case, there is a return to the second measurement step 34.

By way of example, updating the correction terms can be triggered bymeasuring the radiation source to the extent that the latter shows astrong change in same. Furthermore, it is desirable to carry out anupdate when a component of the illumination system is exchanged. Inparticular, then it is desirable to update the geometric correctionterms.

Whether the second query 39 is carried out can, in particular, bedecided and triggered individually by the user of the system. Inparticular, provision can be made for starting the second query 39 onlyupon a user trigger.

To the extent that all correction terms s_(i) and f_(i) are current, itis possible to predict an illumination parameter of an illuminationsetting j* in a prediction step 41. Here, in particular, the currentcorrection terms s_(i) and f_(i) are taken into account.

In particular, the illumination setting j* can be an illuminationsetting which is not contained in the set of calibration settingsj_(kal).

Using the method in accordance with FIG. 2 it is possible, in principle,to evaluate all illumination settings j which can be generated by theillumination system 24. On the other hand, it is only necessary tomeasure a relatively small number of calibration settings j_(Kal) forcalibrating the model in the calibration part 37. This leads to asignificant saving of time. In particular, the method according to thedisclosure renders it possible to use the measurement of the fewillumination settings in order thereby to improve the predictionaccuracy for all illumination settings.

Below, a method for optimizing an illumination setting is described innote form, with reference being made to FIG. 4. Initially, a calibrationof the model for predicting the parameters for evaluating theillumination settings is carried out. To this end, provision is made fora method in accordance with the calibration part 37, the description ofwhich is hereby referred to.

Thereupon, in a first definition 41, an evaluation function is definedfor evaluating an illumination setting. In particular, the evaluationfunction is a function of predetermined illumination parameters, inparticular illumination parameters which can be predicted with the aidof the method described above.

Moreover, a termination criterion is defined in a second definition 42.

Furthermore, an illumination setting j_(start) is defined as startillumination setting in a third definition 43. The start illuminationsetting serves as starting point for an iterative optimization of theillumination setting.

Then, the predetermined illumination parameters, which form thearguments for the evaluation function, are predicted in the predictionpart 38 in accordance with the preceding description, to which referenceis made hereby.

The illumination setting is evaluated in an evaluation step 44 on thebasis of the predicted illumination parameters with the aid of theevaluation function defined in the first definition 41.

A check is carried out in a subsequent query 45 as to whether thetermination criterion defined in the second definition 42 has beenreached. To the extent that this is the case, an acceptable illuminationsetting was found. It can be used, in particular, to illuminate areticle 17 arranged in the object field 18, in particular to image thereticle 17 on the wafer 22 arranged in the image field 20. This isdepicted in summary in FIG. 4 as projection exposure 46.

To the extent that the termination criterion has not been reached, theswitching position of at least one of the field facets 7 is varied in avariation step 47. It is also possible to vary the switching position ofa plurality of field facets 7, in particular of at least two, inparticular of at least three, in particular of at least four, five, six,eight or ten field facets. In principle, it is even possible to vary theswitching positions of all field facets 7.

A new illumination setting emerges from varying at least one of theswitching positions of the field facets 7, which new illuminationsetting in turn is analysed in the prediction part 38 and evaluated inthe evaluation step 44. This is repeated until the predeterminedtermination criterion has been reached.

What is claimed is:
 1. A method for predicting an illumination parameterfor evaluating an illumination setting for illuminating an object fieldof a projection exposure apparatus, the projection exposure apparatuscomprising an illumination optical unit comprising a facet element forgenerating a plurality of illumination settings with a plurality ofillumination channels, the method comprising: calibrating a model forpredicting a plurality of illumination parameters depending on theillumination setting by: providing correction terms for predictionvalues of a first subset of the illumination parameters; measuringactual values of the illumination parameters for a number of calibrationsettings; determining correction terms for prediction values of a secondsubset of the illumination parameters taking into account the measuredactual values; and updating the model taking into account the correctionterms; and using the model to predict an illumination parameter of anillumination setting which is not contained in the set of calibrationsettings.
 2. The method of claim 1, further comprising establishing thecorrection terms on the basis of system data of the illumination opticalunit.
 3. The method of claim 1, further comprising establishing thecorrection terms on the basis of measurements.
 4. The method of claim 1,wherein the illumination parameters which are predictable by the modelcomprise parameters selected from the group consisting of intensitycentroids of an illumination setting and integral intensities of anillumination setting.
 5. The method of claim 1, further comprisingmeasuring a number of calibration settings to provide the correctionterms.
 6. The method of claim 1, wherein the set of correction termscomprises correction terms for predicting intensity centroids ofillumination settings.
 7. The method of claim 1, wherein the set ofcorrection terms comprises correction terms for predicting intensities.8. The method of claim 1, wherein the number of calibration settings fordetermining the correction terms is at most equal to a number ofcalibration settings performed to provide the correction terms.
 9. Themethod of claim 1, further comprising re-determining the correctionterms.
 10. A method of using an illumination optical unit to illuminatea field with an illumination setting, the illumination optical unitcomprising a facet element for generating a plurality of illuminationsettings with a plurality of illumination channels, the methodcomprising: calibrating a model for predicting a plurality ofillumination parameters depending on the illumination setting by:measuring actual values of illumination parameters for a number ofcalibration settings; determining correction terms for prediction valuesof a first subset of the illumination parameters taking into account themeasured actual values; and updating the model taking into accountcorrection terms for prediction values of a second subset of theillumination parameters.
 11. The method of claim 10, further comprisingusing the model to predict an illumination parameter of an illuminationsetting which is not contained in the set of calibration settings. 12.The method of claim 10, wherein the illumination optical unit is a unitof a projection exposure apparatus, and the field is an object field ofthe projection exposure apparatus.
 13. The method of claim 10, whereinthe illumination parameters which are predictable by the model compriseparameters selected from the group consisting of intensity centroids ofan illumination setting and integral intensities of an illuminationsetting.
 14. The method of claim 10, further comprising measuring anumber of calibration settings to provide the correction terms.
 15. Themethod of claim 10, wherein the set of correction terms comprisescorrection terms for predicting intensity centroids of illuminationsettings.
 16. The method of claim 10, wherein the set of correctionterms comprises correction terms for predicting intensities.
 17. Themethod of claim 10, wherein the number of calibration settings fordetermining the correction terms is at most equal to a number ofcalibration settings performed to provide the correction terms.
 18. Themethod of claim 10, further comprising re-determining the correctionterms.
 19. A method for evaluating an illumination setting forilluminating an object field of a projection exposure apparatus, theprojection exposure apparatus comprising an illumination system forgenerating a plurality of illumination settings with a plurality ofillumination channels, the method comprising: providing correction termsfor prediction values of a subset of the illumination parameters;measuring actual values of the illumination parameters at a number ofcalibration settings; determining correction terms for prediction valuesof a subset of the illumination parameters taking into account themeasured values; updating the model taking into account the correctionterms; predicting the illumination parameters for establishing afunctional value of an evaluation function for an illumination settingdepending on the illumination setting, the evaluation function being afunction of predetermined illumination parameters; evaluating theillumination settings via the evaluation function on the basis of thepredicted illumination parameters; and iteratively varying theillumination settings until a predetermined termination criterion isachieved.
 20. The method of claim 19, further comprising at least one ofthe following: establishing the correction terms on the basis of systemdata of the illumination optical unit; and establishing the correctionterms on the basis of measurements.